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Date of Employment:2017-03-01

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英文主页 > Scientific Research > Patents

一种单层细胞膜修饰的纳米通道材料及其制备方法和应用

Release time:2025-10-22 Hits:

Affilication of Author(s):中国地址大学(武汉)
School Sign:中国地址大学(武汉)
Patent Applicant:娄筱叮、夏帆、胡宇昕、王全
Disigner of the Invention:娄筱叮、夏帆、胡宇昕、王全
Type of Patent:Invent
State of Patent:Pending patent
Application Number:202510515329X
Number of Inventors:4
Service Invention or Not:no
First Author:娄筱叮